Carat Systems builds microwave plasma CVD diamond reactors and develops diamond growth processes for electronic diamond, diamond-on-silicon thermal spreaders, UNCD/BEN nucleation, optical diamond, and custom coating applications.
Diamond Manufacturing System, CTS10U for wafer coating, single crystal growth, Bias Enhanced Nucleation, In-Situ 2D film thickness metrology and process optimization for technical applications.
Carat combines reactor hardware, process knowledge, diamond materials, and metrology development. That lets customers evaluate the process, the material, and the equipment path together.
Research and pilot production diamond CVD systems for electronic diamond, optical diamond, thermal management, and gem growth programs.
Polycrystalline diamond wafers, plates, coatings, and diamond-on-silicon development for thermal, optical, electronic, and research applications.
Diamond process development for film uniformity, bow, Raman quality, nucleation, polishing, and scale-up to customer applications.
Carat works with customers where CVD diamond properties matter: thermal conductivity, optical transparency, chemical resistance, plasma compatibility, radiation hardness, and high electric-field performance.
Carat supports customers who need more than a standard reactor. We help define substrates, process windows, film targets, and metrology plans for demanding CVD diamond applications.
Send substrate dimensions, target thickness, material requirements, and intended application. We can help determine whether the next step should be a sample coating, process development program, or reactor discussion.